SILEX II

Modular, automated Wet Processing System for Batch Cleaning and Etching in Heterojunction Solar Cell Production

SILEX II Batch Wet Processing Equipment

The SILEX II ALTEX machine is designed to apply IPA-free texturing processes, offering substantial cost advantages compared to traditional etching systems. This texturing process can be adjusted to the individual requirements of advanced cell technologies.

The SILEX II CLEANTEX combines common etching and cleaning steps of monocrystalline Si with advanced cleaning and conditioning processes. Efficient cleaning steps are an indispensable requirement to improve cell efficiencies and reduce operation costs. Ozone-based cleaning operations, applied on SILEX II wet bench, combine efficient organic and metal removal with an appropriate surface conditioning. Due to low chemical costs and consumption, simple process control and high  metal removal efficiency, ozonized cleaning baths are the perfect substitute for traditional, expensive multi-step RCA cleanings, known from the semiconductor industry.

Comon and Advanced Process Applications

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