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HISTARIS PVD Sputtering System with Horizontal Substrate Transport –
Modular Sputtering System for CIGS & CdTe Thin-Film Solar Modules

The HISTARIS PVD sputtering system was developed for all applications in large area sputtering like solar, architectural glazing, fuel cells and mobile devices. The HISTARIS PVD sputtering system was designed to enhance the efficiency and cutting production costs by using the state-of-the-art technologies. The modular design includes process chambers equipped with rotatable magnetrons for the sputter deposition of high-performance TCO layers or several other materials, such as metals and metal oxides.

Pre-treating modules for cleaning or etching can be added. With its unique modular design, the HISTARIS sputtering system is ideally suited for challenging layer stacks and flexible product mixes. Examples are transparent front or metallic back contact layers as well as multilayered precursors with a broad range of different materials. The main advantage of the system is that it can be used for horizontal vacuumbased coating of glass substrates in solar, display and
many other industries. Typical applications include anti-reflection layers, barrier layers and precursor layers but also different metallic layers such as Al, Cu, NiV, etc.
The HISTARIS system is using an inline process in which the substrates are transported on specially designed carriers or directly on a customized roller drive system. Different automation options for loading and unloading are available.

Typical Performance Characteristics

→ Sputtering material: ITO, AZO and metallic layers like Mo, Al, Cu, Ag, NiV etc.
→ Parallel processing of several substrates
→ Available in 3 versions:
> HISTARIS LAB
> HISTARIS Standard
> HISTARIS Speed
→ Modular configuration
→ Low cost of ownership and high uptime
→ Top down and bottom-up sputtering configurable
→ Sputter sequence configurable
→ DC; pDC; BP and RF process available
→ Rotatable cylindrical magnetrons for highest utilization of target material

 

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