TIMARIS Cluster Tool

Leading Nano-Coating Technologies for Magnetic Storage and Semiconductor Wafer Production

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TIMARIS Cluster Tool

Description

PVD Production Platform for Semiconductor & Magnetic Films

From Spintronics to a wider range of applications

  • Technological leadership in magnetic heterostructures, such as
    _MRAM  _Thin-Film-Heads _Magnetic Sensors
    _Integrated Inductors
  • Growth potential in applying SINGULUS cluster tools in
    _MEMS  _Packaging _RF-Filter _LED
    _Power Electronics

The TIMARIS cluster tool is dedicated for the deposition of ultra-thin metallic and insulating films down to a thickness of one nanometer and below and stacks of such films with very precise material thickness and high uniformity specifications. However, this technology can also be used for applications with thicknesses in the micrometer. The high target utilization allows long lifetime before a target change.

As of today, more than ten process modules are available to configure a TIMARIS system according to customer needs. These modules include the Multi-Target-Module, Oxidation-Process-Module, Pre-Clean-Module, Combi-Process-Module, Four-Target-Module and Static-Deposition-Module as well as the Rotating-Substrate-Module. The Rotating-Substrate-Module is the core module of the ROTARIS platform, our sputtering system with a high flexibility including co-sputtering. The TIMARIS PVD modules incorporate the full scope of sputtering techniques as: DC magnetron sputtering, pulsed DC magnetron sputtering and RF magnetron sputtering as well as combinations of these modes are selectable by recipe.