Main Features

Configuration with ion source and six cathodes. Only left or right located process equipment can be operated at the same time.     Basic configuration with 12 cathodes. Only left or right located process equipment can be operated at the same time.    DC-Sputtering    RF-Sputtering
Left Right Left Right Left: Right: Left: Right:
Four outer cathodes selected Two inner cathodes selected Two cathodes on each side are selectable for RF sputtering
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