TIMARIS

Cluster Tool

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The TIMARIS cluster tool is dedicated for the deposition of ultra-thin metallic and insulating films down to a thickness of one nanometer and below and stacks of such films with very precise material thickness and high uniformity specifications. SINGULUS TECHNOLOGIES is a renowned manufacturer of advanced thin-film deposition equipment for MRAM, thin-film head, sensor and other semiconductor applications. It is the trusted partner in the respective industry and extends its leadership in the thin-film deposition technology for semiconductor applications. SINGULUS TECHNOLOGIES has already established and qualified the second generation of the TIMARIS PVD Cluster Tool platform in the market and is offering a complete portfolio of process modules for different applications.

As of today, more than ten process modules are available to configure a TIMARIS system according to customer needs. These modules include the Multi-Target-Module, Oxidation-Process-Module, Pre-Clean-Module, Combi-Process-Module, Four-Target-Module and Static-Deposition-Module as well as the Rotating-Substrate-Module. The Rotating-Substrate-Module is the core module of the ROTARIS platform, our sputtering system with a high flexibility including co-sputtering. The TIMARIS PVD modules incorporate the full scope of sputtering techniques as: DC magnetron sputtering, pulsed DC magnetron sputtering and RF magnetron sputtering as well as combinations of these modes are selectable by recipe.

Advantages

  • Up to 10 Targets in one deposition chamber
  • High throughput for multilayer deposition with short change time between the materials
  • Outstanding homogeneity due to the patented Linear Dynamic Deposition (Patent US 7,799,179)
  • Excellent Sub-├ů thickness control with high repeatability
  • Very long target life with optimised coating efficiency
  • Low cost of ownership
  • Qualified processes for production
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