Inline Sputtering Systems with Vertical Substrate Transport

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VISTARIS Sputtering Systems

SINGULUS TECHNOLOGIES offers proven sputtering systems with vertical substrate transport with the brand name VISTARIS. One major application is today’s CIGS & CdTe thin-film solar cell production. These systems have been developed to enhance the efficiency of thin-film solar cells, while cutting production costs by using the state-of-the-art technologies. For photovoltaic technology, SINGULUS TECHNOLOGIES develops and manufactures coating systems which can apply special layers and layer systems on different substrates. In addition to applications in the solar sector, this system also offers ideal conditions for other applications such as large glass surfaces. Examples are transparent front or metallic back contact layers as well as multilayered precursors with a broad range of different materials. The VISTARIS system is designed for sputtering material like ITO, AZO and metallic layers like Mo, Al, Cu, Ag, NiV. The main advantage of the system is the use of vertical vacuum-based coating of glass substrates in various industries.

Typical Performance Characteristics

  • Vertical large area PVD sputter systems are used for particle free process requirements
  • Carrier usage for transport of the substrates
  • Largest system built: 1,4 m x 1,6 m, possible up to 3,2 m x 4 m
  • Tact time: up to 45 s per carrier
  • Usage of rotatable cylindrical magnetrons for highest utilization of target material
  • Temperature processing before and during deposition available
  • DC; pDC; BP and RF process available
  • Sputtering material: ITO, AZO and metallic layers like Mo, Al, Cu, Ag, NiV, etc.
  • Vacuum base pressure: < 1 x 10-6 mbar
  • Fast target exchange, use any vendor target
  • Easy expansion possible
  • Vacuum base pressure: < 1 x 10-6 mbar
  • Typical process pressure: 2 - 8 x10-3 mbar
  • No carrier return system necessary
  • Temperature range for deposition: up to 200 °C

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