Manual Wet Process Stations

  • Wet Systems executed for max. 2x6”
  • Applications:
    • Full lap configuration with wet stations (in total 49 wet systems) for Cleaning, Etching, Developing, Resist Spinning, Polymer Processes and Solvent Processes
    • e.g. Si-TMAH-Etch, KOH Etch, NMP Strip / Lift , quartz-tube cleaner
    • Integration of 3rd party equipment like spin-rinse dryers, hotplates, ovens, spin-coaters
OK

We use cookies that are necessary to ensure the functionality and security of this website. Singulus Technologies uses "Google Analytics" cookies for statistical purposes. With the button on the right you can agree to this. You can find more information under this link.