Manual Wet Process Stations

  • Wet Systems executed for max. 2x6”
  • Applications:
    • Full lap configuration with wet stations (in total 49 wet systems) for Cleaning, Etching, Developing, Resist Spinning, Polymer Processes and Solvent Processes
    • e.g. Si-TMAH-Etch, KOH Etch, NMP Strip / Lift , quartz-tube cleaner
    • Integration of 3rd party equipment like spin-rinse dryers, hotplates, ovens, spin-coaters

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