Precise thin film deposition at atomic level by alternating introduction of precursor gases. Used in the semiconductor industry and for demanding applications.

Coating to reduce reflections on glass and optical surfaces, e.g. in camera lenses and displays.

Thin film that prevents the penetration of gases or moisture, e.g. in the packaging or electronics industry.

Inline sputtering system for sputtering processes

Physical process for the deposition of thin metal layers by ion bombardment of the target material (target).

Glossy or colored coatings for decorative purposes, e.g. on plastic or metal parts.

Precise control of the coating thickness by adjusting the process parameters, such as power and duration.

Gas phase process for the chemical deposition of films on substrates, e.g. in the semiconductor and solar industries.

A PVD process in which electron beams are used to vaporize materials in a vacuum chamber and deposit them on substrates.

Vacuum evaporation system

Inline process system for edge passivation of solar cells

Inline sputtering system with horizontal substrate transport, ideal for solar cells and small glasses.

Inline sputtering system with horizontal substrate transport for glass, CIGS and CdTe solar cells.

Water-repellent coatings that keep out dust and dirt, e.g. on spectacle lenses.

Coating by immersing a substrate in a liquid, often for uniform layers.

Efficient variant of sputtering in which magnetic fields increase the ion density. Often used for architectural glass, electronics and optics.

A combination of PVD and ion beam technology that improves the adhesion and density of thin films.

Deposition of metal layers (e.g. aluminum, gold) on substrates, e.g. for electrical conductivity or aesthetics.

Thin-film coatings in the nanometer range, e.g. for functional or decorative purposes.

Unit of length, 1 nanometer = 0.000001 millimeter.

Coatings for improving or modifying the optical properties of glasses or lenses, e.g. for anti-reflection or light filtering.

Process for the deposition of thin films by chemical vapor deposition in a plasma.

Materials that alternate between amorphous and crystalline states, e.g. for optical data storage.

Inline sputtering system especially for 3D parts.

Family of processes for the physical deposition of thin films, e.g. by sputtering, electron beam or thermal evaporation.

Process for producing composite thin films by reacting a target with reactive gases such as oxygen or nitrogen.

Inline evaporation system for large glass substrates.

Active thin film on solar cells for energy generation.

Replication line for the production of DVDs.

Process for coating substrates by spinning liquid materials.

Physical process for the deposition of thin metal layers by ion bombardment of the target material (target).

Fully automatic replication line for recordable discs.

The target material that is deposited on a substrate by sputtering or evaporation.

Thin film deposition process in which materials are heated in a vacuum until they vaporize and deposit on substrates.

Technology for depositing extremely thin layers of material, e.g. for electronics or optical applications.

Vacuum sputtering system, specialized in the production of MRAM wafers and read/write heads.

Material on which the thin film is deposited, e.g. glass, silicon or plastic.

Thin-film coatings that reduce thermal conductivity, e.g. for architectural glass.

Curing of coatings or adhesives by irradiation with ultraviolet light. Often used for protective coatings or functional surfaces.

Closed room in which a vacuum is generated to prevent contamination during the coating processes and to ensure the quality of the thin layers.

Inline sputtering system with vertical substrate transport for glass, CIGS and CdTe solar cells.