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PVD Sputtering System


Inline Sputtering System with Horizontal Substrate Transport for Thin Film Solar & other Applications

Home » Products – PVD, PECVD & Wet Processing » PVD Sputtering System HISTARIS PVD

HISTARIS PVD Sputtering System – Features:

  • Modular machine concept
  • Horizontal substrate transport – with and without carrier
  • Usage of rotatable cylindrical magnetrons for highest utilization of target material
  • Highest deposition rates
  • Temperature processing before and during deposition available
  • Gas separation by dynamic slit valves and/or by individual lock chambers
  • Easy maintenance, low CoO

PVD Sputtering System HISTARIS PVD

The HISTARIS sputtering system was developed for all applications in large area sputtering like solar, architectural glazing, fuel cells and mobile devices. The HISTARIS PVD sputtering system was designed to enhance the efficiency and cutting production costs by using the state-of-the-art technologies. The modular design includes process chambers equipped with rotatable magnetrons for the sputter deposition of high-performance TCO layers or several other materials, such as metals and metal oxides. Pre-treating modules for cleaning or etching can be added. With its unique modular design, the HISTARIS PVD sputtering system is ideally suited for challenging layer stacks and flexible product mixes.

Examples are transparent front or metallic back contact layers as well as multilayered precursors with a broad range of different materials. The main advantage of the system is that it can be used for horizontal vacuum-based coating of glass substrates in solar, display and many other industries. Typical applications include anti-reflection layers, barrier layers and precursor layers but also different metallic layers such as Al, Cu, NiV, etc. The HISTARIS is using an inline process in which the substrates are transported on specially designed carriers or directly on a customized roller drive system.

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