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Sputtering System

VISTARIS Inline Sputtering Systems with Vertical Substrate Transport  for Thin Film Solar & other Applications

Home » Products – PVD, PECVD & Wet Processing » VISTARIS PVD Sputtering System

VISTARIS PVD Sputtering System – Features:

  • No carrier return system necessary
  • Load and unload of substrate from the same side of the machine
  • Usage of rotatable cylindrical magnetrons for highest utilization of target material
  • Temperature processing before and during deposition available
  • Smallest machine footprint through turn chamber technology

VISTARIS PVD Sputtering System

SINGULUS TECHNOLOGIES offers the proven sputtering systems VISTARIS PVD with vertical substrate transport. One major application is today’s CIGS & CdTe thin-film solar cell production. These systems have been developed to enhance the efficiency of thin-film solar cells, while cutting production costs by using the state-of-the-art technologies. For photovoltaic technology, SINGULUS TECHNOLOGIES develops and manufactures coating systems which can apply special layers and layer systems on different substrates. In addition to applications in the solar sector, the VISTARIS PVD sputtering system also offers ideal conditions for other applications such as large glass surfaces. Examples are transparent front or metallic back contact layers as well as multilayered precursors with a broad range of different materials.

The VISTARIS system is design for sputtering material like ITO, AZO and metallic layers like Mo, Al, Cu, Ag, NiV. The main advantage of the system is the use of vertical vacuum-based coating of glass substrates in various industries.

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