VISTARIS Inline Sputtering Systems with Vertical Substrate Transport for Thin Film Solar & other Applications
VISTARIS PVD Sputtering System – Features
- No carrier return system necessary
- Load and unload of substrate from the same side of the machine
- Usage of rotatable cylindrical magnetrons for highest utilization of target material
- Temperature processing before and during deposition available
- Smallest machine footprint through turn chamber technology
VISTARIS PVD
SINGULUS TECHNOLOGIES offers proven PVD sputtering systems with vertical substrate transport with the brand name VISTARIS PVD. One major application is today’s CIGS & CdTe thin-film solar cell production. The VISTARIS PVD Sputtering systems have been developed to enhance the efficiency of thin-film solar cells, while cutting production costs by using the state-of-the-art technologies. For photovoltaic technology, SINGULUS TECHNOLOGIES develops and manufactures PVD sputtering systems which can apply special layers and layer systems on different substrates. In addition to applications in the solar sector, this system also offers ideal conditions for other applications such as large glass surfaces. Examples are transparent front or metallic back contact layers as well as multilayered precursors with a broad range of different materials.
The VISTARIS system is design for sputtering material like ITO, AZO and metallic layers like Mo, Al, Cu, Ag, NiV. The main advantage of the system is the use of vertical vacuum-based coating of glass substrates in various industries.
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SINGULUS SALES TEAM
Phone: +49 6188 440-1292
Email: sales@singulus.de