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Dry Etching – Wet Processing


Dry etching is typically used to clean the substrates, e.g. wafer prior to the deposition process. This is a standard technique employing sputter etch technology by applying RF power to the wafer. Typically, the process removes residual water and other molecules and native oxides by adjusting the  etching process parameters. SINGULUS TECHNOLOGIES also offer wet chemical etching steps e.g. for solar cells and medical devices.

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