Thanks to the patented Linear-Dynamic-Deposition-Technology (LDD) the TIMARIS cluster tool is perfect the deposition film with ultra-precise thickness control down to 0,01 nm and high uniformity. However, this technology can also be used for applications with thicknesses in the micrometer range. The high target utilization allows long lifetime before a target change.
As of today, more than ten process modules are available to configure a TIMARIS system according to customer needs. These modules include the Multi-Target-Module, Oxidation-Process-Module, Pre-Clean-Module, Combi-Process-Module, Four-Target-Module and Static-Deposition-Module as well as the Rotating-Substrate-Module. The Rotating-Substrate-Module is extremely versatile with up to 12 cathodes, possibility to co-sputter, DC and RF.. The TIMARIS PVD modules incorporate the full scope of sputtering techniques as: DC magnetron sputtering, pulsed DC magnetron sputtering and RF magnetron sputtering as well as combinations of these modes are selectable by recipe.