Skip to main content


Wet Processing System

Modular, Automated Wet Processing System for Batch Cleaning and Etching for Solar Cells

Home » Products » SILEX III Wet Processing System

SILEX III Wet Processing System – Features:

  • High throughput 6000-14000 wph gross; M0-M12+
  • High uptime
  • Low breakage rate
  • Ozone-enhanced cleaning & etching
  • Short and stable IPA-free texturing process
  • Appropriate and effective rinsing and drying

SILEX III Wet Processing System

SINGULUS TECHNOLOGIES provides complete automated dry-in/dry-out solutions for wet-chemical treatments of Si-wafers in standard and high-efficiency cell lines. The introduced  modular SILEX III wet processing system offers a wide range of process options. With respect to highest flexibility in configuration, the SILEX III machine is characterized by a clear modular design and a compact footprint. The SILEX III wet processing concept fulfills current and future requirements of capacity, flexibility and reliability for mass production.

The SILEX III was specially designed for larger production volumes. With this mass production system about 550 MW annual capacity are possible for Heterojunction cell manufacturing. The SILEX III system achieves an output starting from 6000 up to 14000 WPH (gross). All SILEX III systems are running with very low scrap rates down to 0.01 % and a  high process yield.

The SILEX III ALTEX machine is designed to apply IPA-free texturing processes, offering substantial cost advantages compared to traditional etching systems. This texturing process can be adjusted to the individual requirements of standard and advanced cell technologies.
The SILEX III CLEANTEX combines common etching and cleaning steps of monocrystalline Si with advanced cleaning and conditioning processes. Efficient cleaning steps are an indispensable requirement to improve cell efficiencies and reduce operation costs. Ozone-based cleaning operations, applied on SILEX III wet bench, combine efficient organic and metal removal with an appropriate surface conditioning. Due to low chemical costs and consumption, simple process control and high metal removal efficiency, ozonized cleaning baths are the perfect substitute for traditional, expensive multi-step RCA cleanings, known from the solar and semiconductor industry.
The SILEX III CLEAN is provided to run dedicated cleaning sequences for pre- or post-deposition processes. Depending on cell process flow and requirement the configuration can be designed individually, involving RCA or Ozone based cleanings as well as slight etching steps.

You have feedback or more questions?
Get in touch with us!

Phone: +49 6188 440-1292

Quick contact to our sales team

Register yourself for news from SINGULUS TECHNOLOGIES

Brochure viewer | SILEX III
Brochure viewer | Crystalline
Cookie Einstellungen Cookie Setup