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GENERIS PVD

Inline Sputtering System

GENERIS PVD Sputtering
for Hydrogen Applications

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GENERIS PVD & VISTARIS PVD

Streamlined Inline Vacuum Coating Systems with Vertical & Horizontal Substrate Transport

High-Performance Coatings for Hydrogen Applications

As the demand for green hydrogen grows, fuel cells and electrolyzers play a pivotal role in the energy transition. A key component in both technologies is the bipolar plate, which ensures efficient gas distribution, electrical conductivity, and durability. High-performance coatings are essential to enhance corrosion resistance, improve conductivity, and extend the lifetime of these critical components.

SINGULUS TECHNOLOGIES develops and manufactures advanced vacuum coating systems for the production of bipolar plates used in fuel cells and electrolyzers. Our inline PVD sputtering systems, including the VISTARIS PVD with vertical substrate transport and the GENERIS PVD series with horizontal substrate transport, enables the deposition of nanometer-precise high-purity specialized layer systems on metallic and composite substrates. These coatings optimize the electrical and chemical properties of bipolar plates, ensuring high efficiency and long-term stability in hydrogen applications.

Leveraging our expertise in thin-film deposition from the solar industry, SINGULUS TECHNOLOGIES provides cutting-edge solutions for large-scale manufacturing. Our PVD coating technologies enable the production of durable, high-performance bipolar plates, paving the way for efficient and sustainable hydrogen energy systems.

GENERIS PVD Machine platforms

  • GENERIS 750 S (Low throughput)
    Deposition area: approx. 510 x 1,500 mm
    Transport mode: Multi pass inline, single/double ended
  • GENERIS 1250 M (High throughput)
    Deposition area: approx. 850 x 1,000 mm
    Transport mode: Inline, double ended
  • GENERIS 1800 L (Ultra high throughput)
    Deposition area: approx. 1,400 x 1,600 mm
    Transport mode: Inline, double ended

Typical Performance Characteristics

  • Parallel processing of several substrates, different substrate sizes possible
  • Modular configuration, manual or semi-automated lab versions on request
  • Low cost of ownership and high uptime
  • Efficient substrate pretreatment before deposition process
  • Substrate heating before and during the deposition process
  • Dual side sputtering
  • Sputter sequence configurable
  • Rotatable cylindrical magnetrons for highest utilization of target material
  • Dedicated precious metal collection and full recycling supply chain

GENERIS 750 S (Low throughput)

GENERIS 1250 M (High throughput)

GENERIS 1800 L (Ultra high throughput)

VISTARIS PECVD

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Phone: +49 6188 440-1292
Email: sales@singulus.de
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GENERIS PVD for Hydrogen
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