GENERIS PVD

GENERIS PVD Inline Sputtering System

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GENERIS Features

  • For transparent conductive oxide layers
  • Sputter material: ITO, AZO, Ag, NiV, Cu, Al, etc
  • Substrates: M4, M6, M10 and M12 & half cut formats
  • Carrier size. 80 wafers (M6) per carrier
  • Throughput (M6): 3,000, 6,800 and 10,000 wph
  • Low cost of ownership and high uptime
  • Top down and bottom up sputtering configurable
  • Sputter sequence configurable
  • Rotatable cylindrical magnetrons
  • Highest utilization of target material
  • Single end and double end version selectable

Numerous SINGULUS TECHNOLOGIES vacuum sputtering machines are in operation in the solar industry, where SINGULUS TECHNOLOGIES provides the GENERIS PVD as a high throughput inline sputtering system platform with horizontal substrate transport. The GENERIS PVD is engineered for the specific requirements of the production of high-performance HJT solar cells. The GENERIS PVD ideally meets the key requirements of the heterojunction cell technology with respect to sophisticated transparent conductive oxide layers (TCO) such as ITO (Indium Tin Oxide) and AZO (Aluminum doped Zinc Oxide). The solar cells are automatically transported through the process chambers of the GENERIS PVD, following the inline principle and applying coatings on both sides. The sputtering system safeguards a high level of layer thickness uniformity with high layer reproducibility, high productivity and at the same time very low operating expenses.

A full substrate temperature control during the whole process section enables optimum layer performance at temperatures ≤ 200 °C. Compared to conventional alternative processes like Reactive Plasma Deposition (RPD), a vacuum inline sputtering system offers a number of clear advantages. Based on the calculation for a 1 GW production fab for HJT solar cells, the CAPEX for using a reduced number of high-throughput sputtering systems from SINGULUS TECHNOLOGIES with a max. capacity of 10,000 wafers per hour (wph) is by far lower compared to RPD systems with a capacity of only 2,500 wph. With the latest system generation GENERIS PVD 10000, SINGULUS TECHNOLOGIES can assure capacities up to 10,000 wph leading to an annual equipment output of about 500 MW.

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